| NUKLEONIKA 1999, 44(2):103-110
SIMS STUDY OF LOW ENERGY IMPLANTATIONJ. Hereæ, J. Filiks, J. Sielanko Institute of Physics, Maria Curie-Sklodowska University, Pl. M. Curie-Sklodowskiej 1, 20-031 Lublin, Poland The paper presents the results of direct, low energy implantation investigations, using the SIMS apparatus. The retained dose for the Cu and Ag samples as a function of irradiation dose of the Cs+ and K+ ions, as a primary beam was measured. From such relation the range profiles of implanted ions were calculated. The comparisons with the results of the computer simulation and analytical theory are also presented. Close X |