NUKLEONIKA 2010, 55(1):13-16

 


MONTE CARLO SIMULATION OF THE POSITRON IMPLANTATION PROFILES IN THE LAYERED SAMPLES



Jerzy Dryzek1,2, Paweł Horodek1

1 The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences,
152 Radzikowskiego Str., 31-342 Kraków, Poland

2 Institute of Physics, University of Zielona Góra,
4a Prof. Z. Szafrana Str., 65-516 Zielona Góra, Poland



Theoretical studies of the positron implantation profiles in the layered samples are presented. Simulations performed using a GEANT4 tool kit revealed accumulation of positrons in denser layer embedded by less dens environment. This effect is significant for implantation profiles of slow positrons formed in a beam. Nevertheless, it is also present in conventional experiments, where positrons are emitted from radioactive nuclei. In some cases the diffusion process, which follows the implantation and thermalization processes, can smear this effect. However, defects on the interfaces or differences in the positron affinity can sustain it.


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